Formation of submicron relief structures on the surface of sapphire substrates
نویسندگان
چکیده
An analysis of technologies that allow creating microrelief structures on the surface sapphire substrates has been carried out. It is shown most effective method forming relief with submicron dimensions ion beam etching through a protective mask formed by photolithography. The main problems in are removal static electric charge process substrates, as well obtaining windows specified sizes, which substrate performed.
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ژورنال
عنوان ژورنال: ?????? ? ????? ???????? ????
سال: 2023
ISSN: ['1729-4428', '2309-8589']
DOI: https://doi.org/10.15330/pcss.24.2.298-303